zonke iindidi
IGraphite
Iindandatho zokutywina zeGraphite eziHlanjululwe kakhulu
Iindandatho zokutywina ze-Isostatic Graphite ze-Semiconductor
Iindandatho zokutywina zeGraphite eziHlanjululwe kakhulu
Iindandatho zokutywina ze-Isostatic Graphite ze-Semiconductor

Iindandatho zokutywina zeGraphite eziHlanjululwe kakhulu


Iiringi zokutywina ze-Semixlab ze-High-Purity Isostatic Graphite zenzelwe ukuxhasa ukusebenza okuzinzileyo nokulawulwa kongcoliseko kwezixhobo zokuvelisa ze-semiconductor eziphambili. Zenziwe nge-graphite ecinezelwe nge-isostatically ecocekileyo kakhulu, ezi ringi zokutywina zibonelela ngokusebenza okuthembekileyo kokutywina kwiindawo ezinobushushu obuphezulu, ezine-vacuum ephezulu, kunye neendawo ezinoburhalarhume beekhemikhali ezihlala zifunyanwa kwiinkqubo ze-epitaxy, CVD / LPCVD / PECVD, diffusion, oxidation, RTP, kunye ne-etch. Iiringi zokutywina ze-graphite ze-Semixlab zinceda ukugcina uzinzo lwenkqubo, ukunciphisa umngcipheko wongcoliseko lwe-particle kunye ne-metal, kunye nokwandisa imijikelo yokugcinwa kwezixhobo. Siyayamkela imibuzo yakho.

inkcazelo

Iiringi zokutywina zeGraphite eziPhucukileyo kakhulu ezivela kwiSemixlab zenziwe ngegraphite ecinezelwe ngokuphucukileyo kakhulu, ezi ringi zokutywina zibonelela ngokusebenza okuzinzileyo, okungcolisekileyo okuncinci okuxhasa ngokuthe ngqo ukuthembeka kwenkqubo, ukuhambelana kwemveliso, kunye nokusebenza kwexesha lezixhobo kwiinkqubo eziphambili zokwenza i-wafer engaphambili.

Kwiinkqubo ze-epitaxy, apho ulawulo oluchanekileyo lokuhamba kwegesi, uzinzo loxinzelelo, kunye nokufana kobushushu kubalulekile, iiRings zeSemixlab zeHigh-Purity Isostatic Graphite Sealing Rings zidlala indima ebalulekileyo ekugcineni ukuthembeka kwe-reactor kumaqondo obushushu ahlala edlula i-1000 °C. Zifakwe kwiindawo zokuhlangana kwegumbi, imida yokuvala, kunye namalungu ajikelezayo okanye amileyo ngaphakathi kwendawo eshushu, ezi rings zokuvala zibonisa ukwanda kobushushu obuphantsi nobungaxutywanga, ezivumela ukuba zigcine uzinzo olulinganayo ngexesha lokujikeleza kobushushu okuphindaphindiweyo. Umxholo wazo wokungcola kwesinyithi ophantsi kakhulu unciphisa umngcipheko wokufakwa kwe-dopant ngengozi okanye ungcoliseko lwesinyithi, ukunceda ukuqinisekisa ubukhulu bomaleko we-epitaxial obufanayo, iiprofayili zokulawula i-doping, kunye nokukhula kwekristale okusemgangathweni ophezulu kwiinkqubo ze-silicon kunye ne-compound semiconductor epitaxy.

Kwizicelo ze-CVD, i-LPCVD, kunye ne-PECVD, izinto zokutywina zibonakaliswa kudibaniso lweegesi zobushushu obuphezulu, i-vacuum, iigesi ze-corrosive precursor, kwaye kwezinye iimeko iindawo ze-plasma. IiRings ze-Semixlab ze-High-Purity Isostatic Graphite Sealing Rings zisetyenziswa kakhulu kwiiseal zegumbi, izakhiwo zokwahlulwa kwegesi, kunye neendawo zokutshintsha phakathi kweendawo ezishushu nezibandayo ze-reactor. Ukumelana kwamakhemikhali okungaphakathi kwe-graphite ecocekileyo kakhulu kwenza ukusebenza okuzinzileyo phambi kweegesi zenkqubo enamandla ezifana ne-HCl, i-NH₃, kunye nee-precursors ezisekelwe kwi-halogen, ngelixa isakhiwo esixineneyo, se-isotropic microstructure sinciphisa ukuveliswa kwamasuntswana kunye nokuwohloka koomatshini ngexesha elide lenkonzo. Xa kuthelekiswa nezisombululo zokutywina zesinyithi, iiringi zokutywina ze-graphite zinika ukumelana okuphezulu kokugqwala kunye nokudinwa kobushushu, okufaka isandla kwixesha elide lokugcinwa kunye nokuphuculwa kokuphindaphinda kwenkqubo kwimveliso ephezulu.

Ukusasazwa kobushushu obuphezulu, i-oxidation, kunye nokulungiswa kobushushu okukhawulezayo kubeka iimfuno ezingqongqo ekusebenzeni kokuvala ngenxa yobushushu obugqithisileyo, amazinga okuhamba kobushushu ngokukhawuleza, kunye nokujikeleza rhoqo kwenkqubo. Kwezi meko, iiRings zeSemixlab zeHigh-Purity Isostatic Graphite Sealing zigcina ingqibelelo yokutywina ehambelanayo kumaqondo obushushu angaphezulu kwe-1100 °C, zixhasa ulawulo oluzinzileyo lomoya ngaphakathi kweetyhubhu ze-furnace kunye neegumbi ze-RTP. Iimpawu ezifanayo zoomatshini ezibonelelwa ngokucinezela kwe-isostatic zinceda ekuthinteleni uxinzelelo lwendawo, ukuqhekeka okuncinci, kunye nokuphazamiseka kwetywina ngexesha lokufudumeza nokupholisa ngokukhawuleza, ngaloo ndlela zinegalelo kwiiprofayili zokusasazwa kwe-dopant ezizinzileyo, ukukhula kwe-oxide efanayo, kunye neziphumo zenkqubo yobushushu ephindaphindwayo ezibalulekileyo kwi-logic ephucukileyo kunye nokwenziwa kwesixhobo sememori.

Kwinkqubo yokuqhekeza, kuquka izicelo zokuqhekeza ezomileyo ezisebenzisa iikhemistri ezisekelwe kwi-halogen kunye neendawo ezincediswa yi-plasma, iiringi zokutywina ziyafuneka ukugcina ingqibelelo ye-vacuum ngelixa kuthintelwa ukuveliswa kweesuntswana kunye nokuwohloka kweekhemikhali. Iiringi zokutywina ze-Semixlab's High-Purity Isostatic Graphite Sealing Rings zihlala zisetyenziswa kwiindawo zokuvezwa kwe-plasma ezingangqalanga, ezifana neendawo zokutywina ezijikeleze igumbi kunye neendawo zokuhlukaniswa kwesakhiwo. Xa zidityaniswe noxinano olufanelekileyo lomphezulu okanye iingubo zokukhusela, ezi ringi zokutywina zibonelela ngokumelana okuthembekileyo neegesi ze-etch ezibolayo kunye noxinzelelo lobushushu, zixhasa iimeko zegumbi ezizinzileyo kwaye zinciphise umngcipheko wokulahleka kwesivuno okunxulumene nongcoliseko.

Yenziwe ngokugxila kubunyulu bezinto, uzinzo lwesakhiwo, kunye nokuthembeka kwexesha elide, ukuhambelana kweSemixlab's High-Purity Isostatic Graphite Sealing Ring kunye neetekhnoloji zokugquma eziphambili kunye nokuhlanganiswa kwizakhiwo zezixhobo ze-semiconductor ezintsonkothileyo kuzenza zibe sisisombululo esithembekileyo see-nodes zenkqubo eziphambili nezivuthiweyo ngokufanayo. Ngokunikezela ngokusebenza okuzinzileyo kokutywina phantsi kweemeko zenkqubo ezifuna kakhulu, iSemixlab ixhasa abavelisi be-semiconductor ekufezekiseni isivuno esiphezulu, ukusetyenziswa kwezixhobo okuphuculweyo, kunye neendleko eziphantsi zobunini. Silangazelela ukuba liqabane lakho lexesha elide eTshayina.

iinkcukacha
Iimpawu ezibonakalayo zegraphite ye-isostatic
ipropati Unit Ixabiso eliqhelekileyo
Unizi lolwapho kuyiwa khona g / cm³ 1.83
ukuqina HSD 58
Ukuhlaliswa kombane μΩ.m 10
Amandla oMbane MPa 47
Amandla anzima MPa 103
Amandla Amandla MPa 31
Imodulus eselula GPA 11.8
Ukwandiswa kweThermal(CTE) 10-6K-1 4.6
Ukuqhuba kobushushu W·m-1·K-1 130
Ubungakanani bomndilili weenkozo μm 8-10
Umsa % 10
Umxholo we-Ash ppm ≤5 (emva kokucoca)
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